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首頁(yè)> 外文OA文獻(xiàn) >Fabrication of FeSi and Fe3Si compounds by electron beam induced mixing of [Fe/Si]2 and [Fe3/Si]2 multilayers grown by focused electron beam induced deposition
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Fabrication of FeSi and Fe3Si compounds by electron beam induced mixing of [Fe/Si]2 and [Fe3/Si]2 multilayers grown by focused electron beam induced deposition

機(jī)譯:通過(guò)電子束誘導(dǎo)的[Fe / Si] 2和[Fe3 / Si] 2多層電子束的混合制備FeSi和Fe3Si化合物,該多層由聚焦電子束誘導(dǎo)沉積生長(zhǎng)

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摘要

Fe-Si binary compounds have been fabricated by focused electron beam induced deposition by the alternating use of iron pentacarbonyl, Fe(CO)5, and neopentasilane, Si5H12 as precursor gases. The fabrication procedure consisted in preparing multilayer structures which were treated by low-energy electron irradiation and annealing to induce atomic species intermixing. In this way, we are able to fabricate FeSi and Fe3Si binary compounds from [Fe/Si]2 and [Fe3/Si]2 multilayers, as shown by transmission electron microscopy investigations. This fabrication procedure is useful to obtain nanostructured binary alloys from precursors which compete for adsorption sites during growth and, therefore, cannot be used simultaneously.
機(jī)譯:通過(guò)交替使用五羰基鐵,F(xiàn)e(CO)5和新戊硅烷,Si5H12作為前驅(qū)體氣體,通過(guò)聚焦電子束誘導(dǎo)沉積來(lái)制備Fe-Si二元化合物。制備程序包括制備多層結(jié)構(gòu),該多層結(jié)構(gòu)通過(guò)低能電子輻照和退火處理以引起原子種類(lèi)的混合。這樣,我們能夠從[Fe / Si] 2和[Fe3 / Si] 2多層膜中制備FeSi和Fe3Si二元化合物,如透射電子顯微鏡研究所示。該制備方法對(duì)于從前體獲得納米結(jié)構(gòu)二元合金是有用的,前體在生長(zhǎng)過(guò)程中競(jìng)爭(zhēng)吸附位點(diǎn),因此不能同時(shí)使用。

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